As with many cosmetics on the market, nail polish carries with it a dose of chemicals that can cause adverse changes in the body. The majority of polishes on the market contain three highly problematic chemicals: toluene, formaldehyde and dibutyl phthalate. There is abundant data on all 3 of these chemicals in the areas of organ toxicity and effects on hormone function that can lead to abnormal cell changes and ultimately disease.
Women who are exposed to these toxicants at critical developmental periods in their life are at even greater risk of contributing to the process of disease that comes with altered cellular behavior. A particularly susceptible phase of development is the adolescent years when changes in the body are rapid. Pregnancy is also a period of increased change that pre-disposes the mother to abnormal shifts in her body's function. With this comes the risk to the developing fetus which along with the mother is highly susceptible to long-term health problems. In a preliminary study conducted by the Northern California Cancer Center, 80% of nail salon workers experienced health problems related to work. These acute health symptoms related to chemical exposure at work were headaches, dizziness, difficulty breathing and skin irritations. While these health problems may not be life threatening, formaldehyde is a known carcinogen and dibutyl phthalate is a known endocrine disruptor, so the effects are bigger than they appear on the surface. Each of us can easily manage our exposure to these and can take a significant role in protecting children and young adults. Ask your salon if they use cosmetics that are free of the "toxic trio" and choose polishes and removers at home that don't use these in their products. When you walk into a salon you should not get a rush of chemical smells. This is not a necessary part of "looking pretty". For more detailed information on "clean products", follow this link to an article in the San Francisco Gate that highlights some of the more thoughtful manufacturers out there!
Thursday, August 4, 2011
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